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State analysis using EPMA

State analysis using EPMA

Estimate bonding states by comparing with standard spectra! Introducing state analysis using EPMA.

In the state analysis using EPMA, changes (shifts and shapes) in the characteristic X-ray peak wavelengths due to differences in the chemical bonding states (ionic valence, crystal structure, coordination number) of oxides and silicates are utilized to estimate the bonding states by comparing with standard spectra. In the identification of two types of copper oxides, when distinguishing between black CuO and red Cu2O by color is difficult, especially for microscopic objects that require an electron microscope, it is possible to grasp the oxidation state using EPMA. Additionally, while XPS is effective for measuring thin oxide layers on aluminum surfaces, EPMA can be used to understand the oxidation state of small foreign particles, bulk materials, and composites. 【Device Specifications】 ■ Manufacturer: JEOL Ltd. Jeol-8200 ■ Analysis Method: Wavelength Dispersive X-ray Analysis (WDX) ■ Analyzable Elements: B to U ■ Energy Resolution: 20 eV (EDX is approximately 130 eV) ■ Detection Limit: 0.01% and above ■ Maximum Sample Size: 100x100 mm *For more details, please refer to the PDF document or feel free to contact us.

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State analysis of cathode active materials using XPS.

State analysis of cathode active materials using XPS.

For the evaluation of lithium-ion battery materials! Analyzing chemical bonding states using X-ray photoelectron spectroscopy.

Regarding the NMC reagent, an evaluation of the valence of metal oxides was conducted through XPS state analysis. Qualitative analysis was performed on commercially available NMC reagents, yielding values for the NiMnCo ratio that are close to the specifications of the reagent. Additionally, F and C, which are thought to originate from the binder component, were also detected. 【Analysis of NMC Reagent (Partial)】 ■ The main oxides of Ni, Mn, and Co are inferred to be NiO (Ni2+), MnO2 (Mn4+), and Co3O4 (a mixed valence of Co2+ and Co3+). ■ C, O, and F show a peak shift consistent with organic compounds thought to originate from the binder. ■ Peak assignments are inferred based on various literature and databases. *For more details, please download the PDF or feel free to contact us.

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[Analysis Case] Evaluation of Sn Surface State by XPS

[Analysis Case] Evaluation of Sn Surface State by XPS

It is possible to calculate the ratio by valence (divalent, tetravalent).

Tin (Sn), such as in solder, is used in many electronic components. In the XPS analysis of the Sn surface, by using the 4d orbitals in addition to the quantitative and state analysis typically performed with the 3d orbitals, it is possible to separate the oxidation states (divalent Sn2+ (SnO) and tetravalent Sn4+ (SnO2)) and calculate their ratios. Furthermore, by examining the valence band, it is possible to sensitively detect even a very small amount of the low oxidation state (divalent Sn2+ (SnO)). This document presents examples of evaluating Sn on the surface of solder using various orbitals.

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Composition and state analysis of magnetic metal multilayer films.

Composition and state analysis of magnetic metal multilayer films.

The characteristics of magnetic resistance elements are important to analyze by combining various analytical methods!

We would like to introduce our "Composition and State Analysis of Magnetic Metal Multilayers." GMR elements and MTJ elements (spintronic devices that include magnetic metal multilayers) are being advanced for practical use in HDD magnetic heads and MRAM. The characteristics of such magnetoresistive elements can vary significantly due to their structure and interfaces, making it important to analyze their behavior using a combination of various analytical methods. 【Interface State Analysis】 ■XPS ■HAXPES ■TEM-EELS ■3DAP (APT) *For more details, please download the PDF or feel free to contact us.

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